| Identification | Back Directory | [Name]
BUFFER SOLUTION | [CAS]
53744-42-6 | [Synonyms]
PBS
BUFFER
BUFFER O
BUFFER, PH 1.0
BUFFER, PH 1.2
BUFFER, PH 2.5
BUFFER, PH 7.5
BUFFER, PH 7.38
BUFFER, PH 8.00
BUFFER, PH 9.18
BUFFER, PH 9.00
BUFFER, PH 6.86
BUFFER, PH 7.00
BUFFER, PH 6.00
BUFFER, PH 5.00
BUFFER SOLUTION
BUFFER, PH 3.00
BUFFER, PH 1.68
BUFFER, PH 2.00
BUFFER, PH 4.01
BUFFER, PH 4.45
BUFFER, PH 4.00
BUFFER, PH 1.00
BUFFER, PH 1.07
PH 11.00 BUFFER
BUFFER, PH 11.00
BUFFER, PH 10.00
BUFFER, PH 12.00
BUFFER, PH 12.45
BUFFER, PH 12.72
BUFFER PH 4.0 RED
BUFFER SOLUTION A
BUFFER SOLUTION B
BUFFER PH 10, BLUE
BUFFER HF-IMPROVED
dibenzenesulfonate
Buffer, Hydrion(R)
BUFFER, HYDRION(TM)
BUFFER SOLUTION 'B'
BUFFER, PH 4.00, RED
BUFFER RINSE SOLUTION
BUFFER MIXTURE PH 4.0
BUFFER MIXTURE PH 7.0
Buffer, Hydrion?
PHOSPHATE BUFF, PH 7.5
PHOSPHATE BUFF, PH 7.2
BUFFER MIXTURE PH 9.22
BUFFER SOLUTION PH 3.0
BUFFER SOLUTION, TISAB
BUFFER TABLETS, PH 6.4
BUFFER TABLETS, PH 6.8
BUFFER TABLETS, PH 7.2
BUFFER MIXTURE, PH 6.4
BUFFER MIXTURE, PH 6.8
BUFFER SOLUTION PH 4.00
BUFFER SOLUTION PH 4.65
BUFFER SOLUTION PH 4.66
BUFFER SOLUTION PH 3.06
BUFFER TNE 10X SOLUTION
BUFFER SOLUTION PH 7.70
BUFFER SOLUTION PH 8.00
BUFFER SOLUTION, PH 9.0
BUFFER SOLUTION PH 9.22
BUFFER SOLUTION PH 9.23
BUFFER SOLUTION PH 9.00
BUFFER SOLUTION, PH 8.0
BUFFER SOLUTION PH 8.90
BUFFER SOLUTION PH 3.00
BUFFER SOLUTION PH 7.00
BUFFER SOLUTION, PH 7.0
BUFFER SOLUTION, PH 4.0
BUFFER SOLUTION PH 2.00
BUFFER SOLUTION PH 3.55
BUFFER SOLUTION PH 6.88
BUFFER SOLUTION PH 6.00
BUFFER SOLUTION PH 5.00
BUFFER SOLUTION PH 6.79
BUFFER SOLUTION PH 6.86
BUFFER SOLUTION, PH 5.0
BUFFER SOLUTION PH 1.00
BUFFER SOLUTION PH 1.09
BUFFER SOLUTION PH 11.0
BUFFER SOLUTION PH 12.0
BUFFER SOLUTION PH 13.0
BUFFER, PH 7.00, YELLOW
BUFFER PH 7.4 PHOSPHATE
BUFFER PHOSPHATE, PH 5.8
BUFFER PHOSPHATE, PH 7.2
BUFFER SOLUTION PH 12.75
BUFFER SOLUTION PH 12.00
BUFFER SOLUTION PH 11.00
BUFFER SOLUTION PH 12.45
BUFFER SOLUTION PH 13.00
BUFFER SOLUTION PH 1.679
BUFFER SOLUTION PH 10.00
BUFFER SOLUTION PH 7.413
BUFFER SOLUTION PH 6.865
BUFFER SOLUTION, PH 9.54
BUFFER SOLUTION, PH 4.01
BUFFER SOLUTION PH 9.180
BUFFER SOLUTION PH 3.776
BUFFER SOLUTION PH 4.006
PHOSPHATE BUFFER, PH 5.8
Buffer Solution, pH 1.01
PHOSPHATE BUFFER SOLUTION
BUFFER PHOSPHATE, PH 7.40
BUFFER SOLUTION PH 10.012
BUFFER SOLUTION PH 12.454
PHOSPHATE-CHLORINE BUFFER
REFERENCE BUFFER SOLUTION
TE BUFFER SOLUTION, PH 8.0
BUFFER POTASSIUM PHOSPHATE
CITRIC ACID BUFFER SOLUTION
BUFFER SOLUTION PH 4.00 RED
BUFFER CONCENTRATE, PH 6.00
BUFFER CONCENTRATE, PH 7.00
BUFFER SOLUTION PH 9.00 BLUE
BUFFER, PH 7, SODIUM ACETATE
BUFFER SOLUTION PH 7.00 GREEN
BLUE-TEN(TM) BUFFER, PH 10.00
BUFFER SOLUTION, PH 5.00, +0.02
BUFFER, PH 4.00, COLOR CODE RED
BUFFER SODIUM PHOSPHATE, PH 7.4
'COLOURKEY' BUFFER PH 4.0 (RED)
Buffer solution, NIST Traceable
TT BUFFER 10X LIQUID CONCENTRATE
Buffer solution HPCE pH 11.0
Bathophenanthrolinesulfonatep.a.
BUFFER, SODIUM PHOSPHATE, PH 7.0
'COLOURKEY' BUFFER PH 10.0 (BLUE)
BUFFER, PH 10.00, COLOR CODE BLUE
BUFFER, FOR CALCIUM AND MAGNESIUM
BUFFER SOLUTION, PH 7.2, PHOSPHATE
BUFFER TRIS, ACN AND EDTA SOLUTION
'COLOURKEY' BUFFER PH 7.0 (YELLOW)
BUFFER, PH 7.00, COLOR CODE YELLOW
Borate phosphate buffer solution
Buffer solution pH 7.00 (20°C)
Buffer Standard solution pH 7.00
BATHOPHENANTHROLINE SULFONATE, REAG.
BUFFER TRIS ACN, EDTA, NACL SOLUTION
BLUE HIGH-ACCURACY BUFFER, PH 10.000
BUFFER, HYDRION(TM), PH 2.00 +/- 0.02
BUFFER, HYDRION(TM), PH 3.00 +/- 0.02
BUFFER, HYDRION(TM), PH 4.00 +/- 0.02
BUFFER, HYDRION(TM), PH 5.00 +/- 0.02
BUFFER, HYDRION(TM), PH 6.00 +/- 0.02
BUFFER, HYDRION(TM), PH 6.86 +/- 0.02
BUFFER, HYDRION(TM), PH 7.00 +/- 0.02
BUFFER, HYDRION(TM), PH 7.40 +/- 0.02
BUFFER, HYDRION(TM), PH 8.00 +/- 0.02
BUFFER, HYDRION(TM), PH 9.00 +/- 0.02
BUFFER, HYDRION(TM), PH 9.18 +/- 0.02
Buffer Solution, pH 6.00, Concentrate
BUFFER, HYDRION(TM), PH 10.00 +/- 0.02
BUFFER, HYDRION(TM), PH 11.00 +/- 0.02
BUFFER, HYDRION(TM), PH 12.00 +/- 0.02
Sodium 4,4'-(1,10-phenanthroline-4,7-diyl)
POTASSIUM CHLORIDE-HYDROCHLORIC ACID BUFFER
RED HIGH-ACCURACY BUFFER SOLUTION, PH 4.000
Bathophenanthroline disulfonic acid-Na2-salt
YELLOW HIGH-ACCURACY BUFFER SOLUTION, PH 7.000
BathophenanthrolineDisulphonicAcidDisodiumS.Gr
Buffer Solution Ph 2.0 (20 °C), With fungicide
Buffer solution pH 7.0 with SDS for HPCE
SODIUM PHOSPHATE DIBASIC-SODIUM HYDROXIDE BUFFER
BATHOPHENANTHROLINE DISULFONIC ACID NA2-SALT H20
Buffer solution for optode membranes pH 7.6
Bathophenanthrolinedisulfonicaciddisodiumsaltp.a.
POTASSIUM ACID PHTHALATE-HYDROCHLORIC ACID BUFFER
4,7-Bis[4-(sodiosulfo)phenyl]-1,10-phenanthroline
POTASSIUM ACID PHTHALATE - SODIUM HYDROXIDE BUFFER
Bathophenanthrolinedisulfonic acid disodium【Dotite】
Buffer Solution, For Water Hardness (Schwarzenback)
BATHOPHENANTHROLINE, SULFONATED SODIUM SALT, REAGENT
Buffer solution, Colored Blue, Specpure?, NIST Traceable
Buffer solution, pH 9.54 (±0.01 at 25°C), NIST Traceable
BATHOPHENANTHROLINEDISULFONIC ACID, DISODIUM SALT HYDRATE
Glycine buffer solution, Glycine-NaOH buffer solution
BATHOPHENANTHROLINEDISULFONIC ACID DISODIUM SALT HYDRATE, 98
SodiuM 4,4'-(1,10-phenanthroline-4,7-diyl)dibenzenesulfonate
1,10-Phenanthroline,4,7-di(phenylsulfonicacid)-,disodiumsalt
4,7-di(4-Phenylsulfonicacid)-1,10-phenanthroline,disodiumsalt
4,7-DIPHENYL-1,10-PHENANTHROLINE DISULFONIC ACID NA2-SALT H2O
Bathophenanthroline disulfonic acid-Na2-salt analytical grade
Buffer Solution, TISAB, Total Ionic Strength Adjustment Buffer
TRIS chloride buffer, TRIS hydrochloride buffer solution
POTASSIUM CARBONATE-POTASSIUM BORATE-POTASSIUM HYDROXIDE BUFFER
POTASSIUM PHOSPHATE MONOBASIC - SODIUM PHOSPHATE DIBASIC BUFFER
BATHOPHENANTHROLINEDISULFONIC ACID DISODIUM SALT TRIHYDRATE 90+%
disodium 4,4'-(1,10-phenanthroline-4,7-diyl)bis(benzenesulphonate)
4 7-DIPHENYL-1,10-PHENANTHROLINE DISULFONIC ACID DISODIUM SALT 99%
Buffer solution, pH 10.00 (±0.01 at 25°C), No Color, NIST Traceable
4,4`-(1,10-Phenanthroline-4,7-diphenyl)disulfonic acid disodiuM salt
4,4’-(1,10-phenanthroline-4,7-diyl)bis-benzenesulfonicacidisodiumsalt
4,7-DIPHENYL-1,10-PHENANTHROLINEDISULFONIC ACID, DISODIUM SALT HYDRATE
Benzenesulfonicacid,4,4’-(1,10-phenanthroline-4,7-diyl)bis-,disodiumsalt
4,4'-(1,10-Phenanthroline-4,7-diyl)bis(benzenesulfonic acid sodium) salt
4,4'-(1,10-phenanthroline-4,7-diyl)bis-Benzenesulfonic acid disodiuM salt
disodium 4-[7-(4-sulfonatophenyl)-1,10-phenanthrolin-4-yl]benzenesulfonate
Buffer solution, pH 6.86 (+/-0.01 @ 25°C), No Color, Specpure, NIST Traceable
Buffer solution, pH 4.01 (+/-0.01 @ 25°C), No Color, Specpure, NIST Traceable
Buffer solution, pH 9.54 (+/-0.01 @ 25°C), No Color, Specpure, NIST Traceable
Buffer solution, pH 7.00 (+/-0.01 @ 25°C), No Color, Specpure, NIST Traceable
Buffer solution, pH 7.00 (±0.01 @ 25°C), No Color, Specpure(R), NIST Traceable | [EINECS(EC#)]
258-152-0 | [Molecular Formula]
C24H14N2Na2O6S2 | [MDL Number]
MFCD00146206 | [MOL File]
53744-42-6.mol | [Molecular Weight]
590.53 |
| Hazard Information | Back Directory | [Uses]
Use of Buffer HF improved:
Buffer HF improved dissolves silica films (both thermally grown and silane SiO2) produced on the surfaces of silicon and exposed by photolithography. It also is capable of dissolving doped silica films such as phosphosilica and borosilica glasses as formed in semiconductor processing.
The overall chemical reaction is: 4HF + SiO2 SiF4 + 2H2O
For trouble-free operation Buffer HF improved is recommended in the new technologies for manufacture of semiconductor planar and mesa devices. It is compatible with both negative and positive photoresists. Excellent results with good reproducibility are simple to achieve without undercutting marked oxides, surface staining or device degradation by metallic impurities. | [Uses]
Use of Buffer HF improved:
- Buffer HF improved dissolves silica films (both thermally grown and silane SiO2) produced on the surfaces of silicon and exposed by photolithography. It also is capable of dissolving doped silica films such as phosphosilica and borosilica glasses as formed in semiconductor processing. The overall chemical reaction is: 4HF + SiO2 SiF4 + 2H2O
- For trouble-free operation Buffer HF improved is recommended in the new technologies for manufacture of semiconductor planar and mesa devices. It is compatible with both negative and positive photoresists. Excellent results with good reproducibility are simple to achieve without undercutting marked oxides, surface staining or device degradation by metallic impurities.
| [Uses]
Used for pretreatment of planar silicon devices when plating with Nickel plating solution products 44069 and 44070. | [Definition]
ChEBI: Disodium 4,7-diphenyl-1,10-phenanthroline 4',4''-disulfonate is an organic sodium salt having 4,7-diphenyl-1,10-phenanthroline 4',4''-disulfonate as the counterion. It has a role as an iron chelator. It contains a 4,7-diphenyl-1,10-phenanthroline 4',4''-disulfonate. | [General Description]
Improved HF Buffer System with stabilized HF activity - selective solvent for SiO2 used in semiconductor technology of planar passivated devices - transistors, integrated circuits, diodes, rectifiers, SCR, MOS, FET
Advantages:
- Ready-to-use - Economical
- HF activity buffer stabilized
- Excellent process reproducibility
- Does not undercut masked oxide
- Will not stain diffused silicon surfaces
- Avoids contamination on silicon surfaces
- Photoresist coating unaffected
Buffer HF improved is an idealized buffer preparation characterized by a high buffer index and an optimized, uniform oxide-etch rate. The composition of buffer HF improved is precisely controlled by HF activity measurements and electrometric pH. The mass balance corresponds essentially to (HF) + (F) + 2(HF2) for a two-ligand mononuclear complex and the charge balance is (H+) - (F) + (HF2- ). The HF activity is maintained constant through the specific equilibrium constant which regulates the equilibrium reaction between fluoride, bifluoride, and HF buffer components. A second equilibrium constant participates in the regulation of the hydronium in concentration of pH.
Buffer HF improved is produced and analyzed to be essentially free of impurities. Nitrate ions, a common impurity causing stains on diffused silicon surfaces, are specifically removed. Heavy metal impurities, which can lead to degradation of device characteristics, are rigidly controlled under manufacturing process specifications. |
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