Identification | Back Directory | [Name]
PSS-(1-PROPYLMETHACRYLATE)-HEPTAISOBUTY& | [CAS]
307531-94-8 | [Synonyms]
Pß MethacrylIsobutyl POSS Methacrylolsobutyl POSS MethacryloIsobutyl POSS PSS-(1-PROPYLMETHACRYLATE)-HEPTAISOBUTY& 3-(3,5,-HEPTAISOBUTYLPENTACYCLO(9.5(3,9) pss-(1-propylmethacrylate)-heptaisobutyl substituted 3-Methacryloyloxypropylheptaisobutyl-T8-silsesquioxane METHACRYLOXYPROPYL SUBSTITUTED POLY(ISOBUTYLSILSESQUIOXANE METHACRYLOXYPROPYLHEPTAISOBUTYL-T8-SILSESQUIOXANE, tech-95 3-(3,5,7,9,11,13,15-heptaisobutylpentacyclo[9.5.13,9.15,15.17,13]octasiloxan-1-yl)propylmethacrylate 2-Propenoic acid, 2-methyl-, 3-[3,5,7,9,11,13,15-heptakis(2-methylpropyl)pentacyclo[9.5.1.13,9.15,15.17,13]octasiloxan-1-yl]propyl ester | [Molecular Formula]
C35H74O14Si8 | [MDL Number]
MFCD02683452 | [MOL File]
307531-94-8.mol | [Molecular Weight]
943.64 |
Chemical Properties | Back Directory | [Melting point ]
108-112 °C(lit.) | [Boiling point ]
>205°C | [density ]
1.09±0.1 g/cm3(Predicted) | [Fp ]
>230 °F | [storage temp. ]
below 5° C | [Hydrolytic Sensitivity]
3: reacts with aqueous base |
Hazard Information | Back Directory | [Uses]
PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase. | [General Description]
PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted silsesquioxane (POSS) is a polyhedral oligomeric silsesquioxane (POSS) with an inorganic-organic cage-like architecture made up of silicon and oxygen. |
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